UF Modules for Producing Ultrapure Water

Ultrapure water blank for boron trace analysis

Weakly charged elements, or elements that are not well dissociated in water, are not removed ef®ciently by conventional water-puri®cation technologies. In the production of high-purity water, silica and boron are generally the ®rst ions to breakthrough into puri®ed water when the ion-exchange resin approaches depletion. In this study, the behavior of these two elements was studied through vario...

Analysis of bacteria contaminating ultrapure water in industrial systems.

Bacterial populations inhabiting ultrapure water (UPW) systems were investigated. The analyzed UPW systems included pilot scale, bench scale, and full size UPW plants employed in the semiconductor and other industries. Bacteria present in the polishing loop of the UPW systems were enumerated by both plate counts and epifluorescence microscopy. Assessment of bacterial presence in UPW by epifluor...

Evaluation of GE Water & Process Technology’s UF Membrane at Various Water Quality Parameters

The main limitation of the ultrafiltration (UF) process in drinking water treatment is membrane fouling. This constant-flux, pilot-scale research evaluates General Electrics (GE) Water & Process Technology’s UF211/UFC211 membrane at various source water conditions such as different humic acid (HA) concentrations, turbidity, pH, alkalinity and calcium ion concentrations. Different backwashing in...

Ultratrace measurement of calcium in ultrapure water using the Agilent 8800 Triple Quadrupole ICP-MS

In the semiconductor industry, the control of metal impurities in the process chemicals used in the manufacture of semiconductor devices is critical to achieve the required product performance and yield. As device performance is continually increasing, the required impurity control becomes ever more stringent. For example, metal content of the ultra pure water (UPW) used in the manufacturing pr...

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